Uniformity control for radio frequency plasma processing systems
US11521832B2 · kind B2 · utility
0Cited by
144References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2021 |
| Grant date | Dec 6, 2022 |
| Priority date | — |
| Expiry date | Jan 8, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A radio frequency plasma processing system including a reaction chamber, a pedestal disposed in the reaction chamber, and a plurality of sector plates disposed azimuthally around the pedestal in an annulus between the pedestal and the reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.