Fabrication process control in optical devices

US11525957B2 · kind B2 · utility

Assignee

• TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · TW

Inventors

• Weiwei Song · San Jose, US
• Chan-Hong Chern · Palo Alto, US
• Chih-Chang Lin · San Jose, US
• Stefan Rusu · Sunnyvale, US
• Min-Hsiang Hsu · Hsinchu, TW

Key dates

• Filing date: Jan 15, 2021
• Grant date: Dec 13, 2022
• Expiry date: Jan 15, 2041

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B2006/12197
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Methods of fabricating optical devices with high refractive index materials are disclosed. The method includes forming a first oxide layer on a substrate and forming a patterned template layer with first and second trenches on the first oxide layer. A material of the patterned template layer has a first refractive index. The method further includes forming a first portion of a waveguide and a first portion of an optical coupler within the first and second trenches, respectively, forming a second portion of the waveguide and a second portion of the optical coupler on a top surface of the patterned template layer, and depositing a cladding layer on the second portions of the waveguide and optical coupler. The waveguide and the optical coupler include materials with a second refractive index that is greater than the first refractive index.