Compensation of creep effects in an imaging device

US11526089B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Marwene Nefzi · Ulm, DE
• Stefan Hembacher · Bobingen, DE
• Stefan Troeger · Ulm, DE
• Ralf Zweering · Aalen, DE
• Konrad Carl Steimer · Mannheim, DE

Key dates

• Filing date: Jun 22, 2021
• Grant date: Dec 13, 2022
• Expiry date: Aug 19, 2041

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/709
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each of the supporting spring devices defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which measures the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom up to all six degrees of freedom in space. A reduction device reduces a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.