Substrate cleaning compositions, substrate cleaning method and substrate treating apparatus
US11530375B2 · kind B2 · utility
0Cited by
2References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 11, 2019 |
| Grant date | Dec 20, 2022 |
| Priority date | — |
| Expiry date | Oct 11, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A composition for cleaning a substrate is provided. According to an embodiment, the composition for cleaning the substrate includes an organic solvent having a Hansen solubility parameter of 5 or more to 12 or less for polystyrene latex to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.