Extreme ultraviolet (EUV) mask inspection system, a load-lock chamber included therein, and a method for inspecting an EUV mask using the EUV mask inspection system
US11531277B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 12, 2021 |
| Grant date | Dec 20, 2022 |
| Priority date | — |
| Expiry date | Oct 12, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70916
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An EUV mask inspection system includes a mask receiving unit configured to receive a manufactured EUV mask, a main chamber configured to perform an inspection on the EUV mask, and a load-lock chamber disposed between the mask receiving unit and the main chamber. The load-lock chamber includes a mask table for loading the EUV mask, an UV lamp disposed adjacent the mask table in a first direction, a cold trap disposed adjacent the mask table in a second direction, and a vacuum pump. The first direction is a direction perpendicular to a sidewall of the mask table, and the second direction is a direction perpendicular to a top surface of the mask table. The UV lamp is configured to evaporate water molecules on the EUV mask by irradiating UV light onto the EUV mask. The cold trap is configured to trap the water molecules evaporated from the EUV mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.