Patent · US Active

Silica glass crucible

US11535546B2 · kind B2 · utility

0Cited by
0References
20Claims
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Assignee

Inventors

Key dates

Filing dateNov 2, 2018
Grant dateDec 27, 2022
Priority date
Expiry dateApr 3, 2039

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03C2201/02
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A silica glass crucible includes a cylindrical side wall portion, a curved bottom portion, and a corner portion that is provided between the side wall portion and the bottom portion and has a higher curvature than a curvature of the bottom portion, in which a first region provided from a crucible inner surface to a middle in a thickness direction, a second region that is provided outside the first region in the thickness direction and has a different strain distribution from the first region, and a third region that is provided outside the second region in the thickness direction and up to the crucible outer surface and has a different strain distribution from the second region, are provided, and internal residual stresses of the first region and the third region are compressive stresses, whereas an internal residual stress of the second region includes a tensile stress.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.