Patent · US Active

Photomask assembly with reflective photomask and method of manufacturing a reflective photomask

US11537039B2 · kind B2 · utility

0Cited by

1References

9Claims

0Family size

Assignee

ADVANCED MASK TECHNOLOGY CENTER GMBH & CO. KG · DE

Inventors

Thorsten Schedel · Dresden, DE
Markus Bender · Dresden, DE
Andreas Schenke · Langenbruck, DE

Key dates

Filing date	Jan 10, 2020
Grant date	Dec 27, 2022
Priority date	—
Expiry date	Apr 10, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/60
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A photomask mask assembly includes a reflective photomask and a protection structure. The reflective photomask includes a substrate and a reflective multilayer on a first substrate surface of the substrate at a front side of the reflective photomask. The protection structure is on a second substrate surface of the substrate at a backside of the reflective photomask, and is detachable from the reflective photomask at a temperature below 150 degree Celsius.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.