Thorsten Schedel
15Patents
5h-index
22Co-inventors
62Inventor score
Filing activity: Mar 28, 2002 → Jan 10, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6684124B2 | Method for controlling a processing device for a sequential processing of semiconductor wafers | Electricity | 24 | Expired |
| US8097955B2 | Interconnect structures and methods | Electricity | 12 | Active |
| US6908775B2 | Method for performing an alignment measurement of two patterns in different layers on a semiconductor wafer | Physics | 8 | Expired |
| US6593254B2 | Method for clamping a semiconductor device in a manufacturing process | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6861331B2 | Method for aligning and exposing a semiconductor wafer | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6887722B2 | Method for exposing a semiconductor wafer | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6780552B2 | Method for controlling the quality of a lithographic structuring step | Electricity | 3 | Expired |
| US6806008B2 | Method for adjusting a temperature in a resist process | Physics | 3 | Expired |
| US7304716B2 | Method for purging an optical lens | Physics | 3 | Expired |
| US6979522B2 | Method for exposing at least one or at least two semiconductor wafers | Physics | 2 | Expired |
| US7248365B2 | Method for adjusting a substrate in an appliance for carrying out exposure | Physics | 1 | Expired |
| US6892108B2 | Method for adjusting processing parameters of at least one plate-shaped object in a processing tool | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7186484B2 | Method for determining the relative positional accuracy of two structure elements on a wafer | Electricity | 1 | Expired |
| US10031409B2 | Reflective photomask and reflection-type mask blank | Physics | 0 | Active |
| US11537039B2 | Photomask assembly with reflective photomask and method of manufacturing a reflective photomask | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.