Method and apparatus for calibration of substrate temperature using pyrometer
US11543296B2 · kind B2 · utility
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6References
20Claims
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Key dates
| Filing date | Aug 26, 2019 |
| Grant date | Jan 3, 2023 |
| Priority date | — |
| Expiry date | Aug 14, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68714
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method may include heating a substrate in a first chamber to a platen temperature, the heating comprising heating the substrate on a platen; measuring the platen temperature in the first chamber using a contact temperature measurement; transferring the substrate to a second chamber after the heating; and measuring a voltage decay after transferring the substrate to the second chamber, using an optical pyrometer to measure pyrometer voltage as a function of time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.