Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device
US11550217B2 · kind B2 · utility
0Cited by
10References
21Claims
0Family size
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Key dates
| Filing date | Dec 22, 2016 |
| Grant date | Jan 10, 2023 |
| Priority date | — |
| Expiry date | Dec 22, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07C2603/74
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I): wherein, EWG, Y, R, and M+ are the same as described in the specification.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.