Dynamic amelioration of misregistration measurement
US11551980B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 2019 |
| Grant date | Jan 10, 2023 |
| Priority date | — |
| Expiry date | Sep 15, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A dynamic misregistration measurement amelioration method including taking at least one misregistration measurement at multiple sites on a first semiconductor device wafer, which is selected from a batch of semiconductor device wafers intended to be identical, analyzing each of the misregistration measurements, using data from the analysis of each of the misregistration measurements to determine ameliorated misregistration measurement parameters at each one of the multiple sites, thereafter ameliorating misregistration metrology tool setup for ameliorated misregistration measurement at the each one of the multiple sites, thereby generating an ameliorated misregistration metrology tool setup and thereafter measuring misregistration at multiple sites on a second semiconductor device wafer, which is selected from the batch of semiconductor device wafers intended to be identical, using the ameliorated misregistration metrology tool setup.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.