Selective monitoring of multiple silicon compounds
US11555798B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2019 |
| Grant date | Jan 17, 2023 |
| Priority date | — |
| Expiry date | Apr 20, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31111
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatuses for selective monitoring of multiple silicon compounds in etchant solutions are provided. Methods can include reacting a test solution comprising a plurality of different silicon compounds with a fluoride-based compound in several conditions to provide different silicon:reagent binding ratios. One of the conditions can include the addition of a co-solvent to the test solution. Concentrations of the multiple silicon compounds can be determined based on the different binding ratios of silicon:reagent. Methods can further include a measuring method such as silicon elemental analysis or measuring of functional groups of a certain silicon form of a first portion of a test solution comprising a plurality of different silicon compounds and reacting a second portion of the solution with a fluoride-based compound to provide a silicon:reagent binding ratio. Concentrations of the multiple silicon compounds can be determined based on the measuring method and binding ratio measurements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.