Patent · US Active

Low turn-on voltage GaN diodes having anode metal with consistent crystal orientation and preparation method thereof

US11557682B1 · kind B1 · utility

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3Claims
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Assignee

Inventors

Key dates

Filing dateJan 19, 2022
Grant dateJan 17, 2023
Priority date
Expiry dateJan 19, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D64/64
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A low turn-on voltage GaN diode having an anode metal with a consistent crystal orientation and a preparation method thereof. The low turn-on voltage GaN diode having an anode metal with a consistent crystal orientation provided by the present disclosure includes a substrate layer, a GaN buffer layer, a GaN channel layer and an AlGaN barrier layer, which are arranged in sequence from bottom to top; a cathode arranged on the AlGaN barrier layer; a groove arranged in the GaN channel layer and the AlGaN barrier layer, and an anode provided on a bottom and a side wall of the groove and part of the AlGaN barrier layer; a dielectric layer provided on an uncovered portion of the AlGaN barrier layer; wherein, a contact portion of the anode with the groove and the AlGaN barrier layer is W or Mo metal with a crystal orientation of <100>.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.