Patent · US Active

Shadow mask with plasma resistant coating

US11566322B2 · kind B2 · utility

1Cited by

1References

13Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Xi Huang · Hubei, CN
Fei Peng · Longbeilingcun, CN
Kiran Krishnapur · Milpitas, US
Ruiping Wang · Zhejiang, CN
Jrjyan Jerry CHEN · Santa Clara, US
Steven Verhaverbeke · San Francisco, US
Robert Jan Visser · Menlo Park, US

Key dates

Filing date	May 24, 2016
Grant date	Jan 31, 2023
Priority date	—
Expiry date	Apr 22, 2039

Classification

Technology area (CPC H)Electricity
CPC primaryH10K71/166
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A mask assembly (100) includes a mask frame (102) and a mask screen (104), both of the mask frame (102) and the mask screen (104) made of a metallic material, and a metal coating (125) disposed on exposed surfaces of one or both of the mask frame (102) and the mask screen (104).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.