Vaporizable source material container and solid vaporization/supply system using the same
US11566326B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 5, 2020 |
| Grant date | Jan 31, 2023 |
| Priority date | — |
| Expiry date | Feb 5, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided is a vaporizable source material container having excellent corrosion resistance. The vaporizable source material container for storing and vaporizing a metal halide for thin film deposition S includes: a container main body including a container wall; a lid body provided with a carrier gas inlet and a mixed gas outlet; fastening members for fixing the container main body with the lid body; and joint members, wherein the container wall of the container main body is fabricated of copper with 99 to 99.9999% purity, aluminum with 99 to 99.9999% purity, or titanium with 99 to 99.9999% purity, and the container main body, the lid body, the fastening members and the joint members are each treated by fluorocarbon polymer coating and/or by electrolytic polishing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.