Anti-slippery stamp landing ring
US11567417B2 · kind B2 · utility
0Cited by
2References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2022 |
| Grant date | Jan 31, 2023 |
| Priority date | — |
| Expiry date | Jan 19, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/26
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Apparatus and methods of performing nanoimprint lithography using an anti-slip landing ring are provided. In one embodiment, a process chamber for nanoimprint lithography is provided and includes a substrate support and a ring disposed on the substrate support. The ring has a top surface opposite the substrate support, and the top surface has a grid pattern. A bottom surface facing the substrate support has a different pattern compared to the grid pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.