Characterization of an electron beam
US11579318B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 12, 2020 |
| Grant date | Feb 14, 2023 |
| Priority date | — |
| Expiry date | Nov 12, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2235/082
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for characterizing an electron beam in a liquid metal jet X-ray source. The method includes providing the electron beam and directing the electron beam to an interaction region; providing an electron beam dump connected to ground potential for receiving the electron beam after it has traversed the interaction region; scanning the electron beam over at least part of the interaction region; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile. Also a corresponding liquid metal jet X-ray source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.