Low profile deposition ring for enhanced life
US11581166B2 · kind B2 · utility
0Cited by
40References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 31, 2020 |
| Grant date | Feb 14, 2023 |
| Priority date | — |
| Expiry date | Jan 16, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/022
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments of deposition rings for use in a process chamber are provided herein. In some embodiments, a deposition ring includes: an annular body; an inner wall extending upward from an inner portion of the annular body; and an outer wall extending upward form an outer portion of the annular body to define a large deposition cavity between the inner wall and the outer wall, wherein a width of the large deposition cavity is about 0.35 inches to about 0.60 inches, wherein the outer wall includes an outer ledge and an inner ledge raised with respect to the outer ledge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.