Chemical solution evaporation device and substrate processing device including the same
US11590460B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2021 |
| Grant date | Feb 28, 2023 |
| Priority date | — |
| Expiry date | Aug 17, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01F2101/56
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A chemical solution vaporization device includes a chemical solution tank including chemical solution vaporization rooms, a chemical solution sensing room, and a chemical solution supply room. A first internal wall separating the plurality of chemical solution vaporization rooms from each other includes a first opening at a lower portion thereof. A second internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution supply room includes a second opening at a lower portion thereof. A third internal wall separating at least one of the plurality of chemical solution vaporization rooms from the chemical solution sensing room includes a third opening at a lower portion thereof. And a lower portion of a fourth internal wall separating the chemical solution sensing room from the chemical solution supply room is combined with the lower wall.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.