Method for fabricating chamber parts

US11591689B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Mats Larsson · Kalmar, SE
• Kevin A. PAPKE · Portland, US
• Chirag Shaileshbhai KHAIRNAR · Sayla, IN
• Rajasekhar PATIBANDLA · Kanchinakote, IN
• Karthikeyan Balaraman · Kanchinakote, IN
• Balamurugan Ramasamy · Kanchinakote, IN
• Kartik Shah · Saratoga, US
• Umesh M. Kelkar · Santa Clara, US

Key dates

• Filing date: Feb 14, 2020
• Grant date: Feb 28, 2023
• Expiry date: Feb 14, 2040

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/31678
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

One embodiment of the disclosure provides a method of fabricating a chamber component with a coating layer disposed on an interface layer with desired film properties. In one embodiment, a method of fabricating a coating material includes providing a base structure comprising an aluminum or silicon containing material, forming an interface layer on the base structure, wherein the interface layer comprises one or more elements from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and forming a coating layer on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz. In another embodiment, a chamber component includes an interface layer disposed on a base structure, wherein the interface layer is selected from at least one of Ta, Al, Si, Mg, Y, or combinations thereof, and a coating layer disposed on the interface layer, wherein the coating layer has a molecular structure of SivYwMgxAlyOz.