Photoresist composition, its manufacturing method, and manufacturing methods of metal pattern and array substrate
US11592742B2 · kind B2 · utility
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17References
13Claims
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Key dates
| Filing date | May 22, 2018 |
| Grant date | Feb 28, 2023 |
| Priority date | — |
| Expiry date | Aug 15, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition and manufacturing method thereof, a manufacturing method of a metal pattern, and a manufacturing method of an array substrate are provided. The photoresist composition includes a base material and an ion adsorbent, and the ion adsorbent is chelating resin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.