Method, materials and process for native oxide removal and regrowth of dielectric oxides for better biosensor performance

US11598000B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Ranga Rao Arnepalli · Krishna, IN
• Colin C. Neikirk · Mountain View, US
• Yuriy Melnik · San Jose, US
• Suresh Chand Seth · Mumbai, IN
• Pravin K. Narwankar · Sunnyvale, US
• Sukti Chatterjee · San Jose, US
• Lance A. Scudder · Sunnyvale, US

Key dates

• Filing date: Sep 21, 2018
• Grant date: Mar 7, 2023
• Expiry date: Sep 21, 2038

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/02068
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Methods of removing native oxide layers and depositing dielectric layers having a controlled number of active sites on MEMS devices for biological applications are disclosed. In one aspect, a method includes removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands in vapor phase to volatize the native oxide layer and then thermally desorbing or otherwise etching the volatized native oxide layer. In another aspect, a method includes depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate. In yet another aspect, a method includes both removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands and depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate.