Deposition apparatus including an off-axis lift-and-rotation unit and methods for operating the same
US11598005B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | May 7, 2020 |
| Grant date | Mar 7, 2023 |
| Priority date | — |
| Expiry date | Mar 10, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3323
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition chamber includes a vacuum enclosure, an electrostatic chuck having a flat top surface located within a vacuum enclosure, a lift-and-rotation unit extending through or laterally surrounding the electrostatic chuck at a position that is laterally offset from a vertical axis passing through a geometrical center of the electrostatic chuck, a gas supply manifold configured to provide influx of gas into the vacuum enclosure, and a pumping port connected to the vacuum enclosure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.