Epitaxial oxide materials, structures, and devices
US11621329B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 7, 2022 |
| Grant date | Apr 4, 2023 |
| Priority date | — |
| Expiry date | Mar 7, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/817
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In some embodiments, a semiconductor structure includes: a first region comprising a first epitaxial oxide material; a second region comprising a second epitaxial oxide material; and a chirp layer located between the first and the second regions. The chirp layer can include alternating layers of a plurality of wide bandgap epitaxial oxide material layers (WBG layers) and a plurality of narrow bandgap epitaxial oxide material layers (NBG layers), wherein thicknesses of the NBG layers and the WBG layers change throughout the chirp layer. The WBG layer can comprise (Alx1Ga1−x1)y1Oz1, wherein x1 is from 0 to 1, wherein y1 is from 1 to 3, and wherein z1 is from 2 to 4. The NBG layer can comprise (Alx2Ga1x−2)y2Oz2, wherein x2 is from 0 to 1, wherein y2 is from 1 to 3, and wherein z2 is from 2 to 4, and wherein x1 and x2 are different from one another.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.