Imprint lithography
US11635696B2 · kind B2 · utility
1Cited by
16References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 14, 2020 |
| Grant date | Apr 25, 2023 |
| Priority date | — |
| Expiry date | Dec 14, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C2043/142
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.