Analyzing in-plane distortion
US11637043B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 3, 2020 |
| Grant date | Apr 25, 2023 |
| Priority date | — |
| Expiry date | Dec 1, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods, systems, and non-transitory computer readable medium are described for generating assessment maps for corrective action. A method includes receiving a first vector map including a first set of vectors each indicating a distortion of a particular location of a plurality of locations on a substrate. The method further includes generating a second vector map including a second set of vectors by rotating a position of each vector in the first set of vectors. The method further includes generating a third vector map including a third set of vectors based on vectors in the second set of vectors and corresponding vectors in the first set of vectors. The method further includes generating a fourth vector map by subtracting each vector of the third set of vectors from a corresponding vector in the first set of vectors. The fourth vector map indicates a planar component of the first vector map.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.