Method for producing a waveguide, circuit device and radar system
US11646479B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 15, 2020 |
| Grant date | May 9, 2023 |
| Priority date | — |
| Expiry date | Dec 26, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2201/10098
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for producing a waveguide in a multilayer substrate involves producing at least one cutout corresponding to a lateral course of the waveguide in a surface of a first layer arrangement comprising one or a plurality of layers. A metallization is produced on surfaces of the cutout. A second layer arrangement comprising one or a plurality of layers is applied on the first layer arrangement. The second layer arrangement comprises, on a surface thereof, a metallization which, after the second layer arrangement has been applied on the first layer arrangement, is arranged above the cutout and together with the metallization on the surfaces of the cutout forms the waveguide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.