Laser processing apparatus and optical adjustment method
US11648624B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 28, 2020 |
| Grant date | May 16, 2023 |
| Priority date | — |
| Expiry date | Sep 2, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/50
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A laser processing apparatus emits processing light, measurement light, processing guide light, and measurement guide light with which a surface of a workpiece is irradiated. Respective wavelengths of the processing guide light and the measurement guide light are set to wavelengths at which a deviation amount between an irradiation position of the processing guide light and an irradiation position of the measurement guide light due to a chromatic aberration of magnification of a lens, and a deviation amount between an irradiation position of the processing light and an irradiation position of the measurement light due to the chromatic aberration of magnification of the lens are equal to each other. Therefore, positioning of spot positions of a plurality of laser lights having different output differences can be realized with high accuracy and high speed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.