Semiconductor device and method for manufacturing the same
US11651996B2 · kind B2 · utility
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7References
20Claims
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Key dates
| Filing date | Feb 19, 2021 |
| Grant date | May 16, 2023 |
| Priority date | — |
| Expiry date | Jul 19, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/60
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor device includes first, second, and third metallization layers, on top of one another, that are disposed above a substrate, wherein each of the first, second, and third metallization layer includes a respective metallization structure formed in a respective dielectric layer, wherein the second metallization layer is disposed between the first and third metallization layers; and a via tower structure that extends from the first metallization layer to the third metallization layer so as to electrically couple at least part of the respective metallization structures of the first and third metallization layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.