Patent · US Active

Vacuumizing device and vacuumizing method for bonding substrate

US11664228B2 · kind B2 · utility

0Cited by
2References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 19, 2018
Grant dateMay 30, 2023
Priority date
Expiry dateJul 20, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68785
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A vacuumizing device includes a vacuum chamber, a bonding fixture and a vacuumizing system. The bonding fixture is disposed in the vacuum chamber and includes a substrate table provided with a plurality of grooves for retention of the substrate by suction. The vacuumizing system is disposed in communication with both the vacuum chamber and grooves. During vacuumizing by the vacuumizing system, a vacuum value in the grooves is smaller than or equal to a vacuum value in the vacuum chamber. In the vacuumizing device and methods, the vacuumizing system is used to vacuumize the grooves in the substrate table and the vacuum chamber so that the vacuum value in the grooves is always smaller than or equal to that in the vacuum chamber. As a result, the substrates are firmly retained on the substrate table without warping, thereby improving the quality of substrate bonding.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.