Bin Zhao
300Patents
25h-index
491Co-inventors
93Inventor score
Filing activity: Jan 16, 1996 → Apr 22, 2025
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5674787A | Selective electroless copper deposited interconnect plugs for ULSI applications | Emerging Cross-Sectional Technologies | 640 | Expired |
| US5695810A | Use of cobalt tungsten phosphide as a barrier material for copper metallization | Electricity | 606 | Expired |
| US6187672A | Interconnect with low dielectric constant insulators for semiconductor integrated circuit manufacturing | Electricity | 477 | Expired |
| US5824599A | Protected encapsulation of catalytic layer for electroless copper interconnect | Emerging Cross-Sectional Technologies | 459 | Expired |
| US5891513A | Electroless CU deposition on a barrier layer by CU contact displacement for ULSI applications | Emerging Cross-Sectional Technologies | 450 | Expired |
| US5830805A | Electroless deposition equipment or apparatus and method of performing electroless deposition | Emerging Cross-Sectional Technologies | 292 | Expired |
| US6509623B2 | Microelectronic air-gap structures and methods of forming the same | Electricity | 232 | Expired |
| US6567813B1 | Quality of service maintenance for distributed collaborative computing | Physics | 230 | Expired |
| US6037664A | Dual damascene interconnect structure using low dielectric constant material for an inter-level dielectric layer | Emerging Cross-Sectional Technologies | 186 | Expired |
| US6100184A | Method of making a dual damascene interconnect structure using low dielectric constant material for an inter-level dielectric layer | Emerging Cross-Sectional Technologies | 148 | Expired |
| US6071809A | Methods for forming high-performing dual-damascene interconnect structures | Electricity | 144 | Expired |
| US7408330B2 | Voltage up-conversion circuit using low voltage transistors | Electricity | 128 | Active |
| US7130883B2 | Distributed network system architecture for collaborative computing | Electricity | 115 | Expired |
| US6925645B2 | Fault tolerant server architecture for collaborative computing | Electricity | 108 | Expired |
| US7073127B2 | Video editing GUI with layer view | Physics | 107 | Expired |
| US7069298B2 | Fault-tolerant distributed system for collaborative computing | Emerging Cross-Sectional Technologies | 106 | Expired |
| US6245663A | IC interconnect structures and methods for making same | Electricity | 82 | Expired |
| US5736457A | Method of making a damascene metallization | Electricity | 77 | Expired |
| US6211561A | Interconnect structure and method employing air gaps between metal lines and between metal layers | Electricity | 73 | Expired |
| US7353253B1 | Peer-to-peer messaging system | Electricity | 65 | Expired |
| US6417094B1 | Dual-damascene interconnect structures and methods of fabricating same | Electricity | 63 | Expired |
| US6271127A | Method for dual damascene process using electron beam and ion implantation cure methods for low dielectric constant materials | Emerging Cross-Sectional Technologies | 60 | Expired |
| US6198170A | Bonding pad and support structure and method for their fabrication | Electricity | 59 | Expired |
| US6627539B1 | Method of forming dual-damascene interconnect structures employing low-k dielectric materials | Electricity | 50 | Expired |
| US6984577B1 | Damascene interconnect structure and fabrication method having air gaps between metal lines and metal layers | Electricity | 26 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.