Process apparatus with on-the-fly substrate centering
US11664259B2 · kind B2 · utility
0Cited by
26References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 29, 2020 |
| Grant date | May 30, 2023 |
| Priority date | — |
| Expiry date | Dec 29, 2040 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/136
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus including a frame defining a chamber with a substrate transport opening and a substrate transfer plane defined therein, a valve mounted to the frame and being configured to seal an atmosphere of the chamber when closed, the valve having a door movably disposed to open and close the substrate transport opening, and at least one substrate sensor element disposed on a side of the door and oriented to sense substrates located on the substrate transfer plane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.