Fast arc detecting match network
US11670488B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 8, 2021 |
| Grant date | Jun 6, 2023 |
| Priority date | — |
| Expiry date | Dec 18, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32944
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of detecting plasma asymmetry in a radio frequency plasma processing system, the method including providing a radio frequency power to a reaction chamber having an approximate chamber symmetry axis and receiving from a plurality of broadband electromagnetic sensors a radio frequency signal. The method also including processing the radio frequency signals using Fourier analysis and determining based on the Fourier analysis of the radio frequency signals that a plasma asymmetry has occurred within the reaction chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.