Composition for manufacturing passivation layer and passivation layer using the same
US11674047B2 · kind B2 · utility
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2References
18Claims
0Family size
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Key dates
| Filing date | Jan 28, 2020 |
| Grant date | Jun 13, 2023 |
| Priority date | — |
| Expiry date | May 30, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D129/10
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention relates to a composition for manufacturing a passivation layer, and specifically, to a composition for manufacturing a passivation layer and a passivation layer formed using the composition, which simultaneously exhibit effects such as a low dielectric constant, a low water absorption rate, excellent pattern formability, and excellent adhesion to an adherend surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.