Method of cleaning reaction tube, method of manufacturing semiconductor device, and substrate processing apparatus
US11685993B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jan 22, 2021 |
| Grant date | Jun 27, 2023 |
| Priority date | — |
| Expiry date | Jan 22, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67028
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
There is provided a technique that includes a first annealing step of annealing the reaction tube; a first cleaning step of cleaning an inner surface of the reaction tube, after the first annealing step, with a liquid including a fluorine compound having a first concentration; a first rinsing step of washing away the fluorine compound used in the first cleaning step with pure water; a second annealing step of annealing the reaction tube; a second cleaning step of cleaning the inner surface of the reaction tube, after the second annealing step, with a liquid including a fluorine compound having a second concentration higher than the first concentration; and a second rinsing step of washing away the fluorine compound used in the second cleaning step with pure water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.