Substrate processing apparatus, storage medium and substrate processing method
US11685998B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Jun 21, 2018 |
| Grant date | Jun 27, 2023 |
| Priority date | — |
| Expiry date | Sep 3, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45525
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Examples of a substrate processing apparatus includes a device for subjecting a substrate to processing, and a controller for modifying a control parameter predetermined to control the device with a first modification value and a second modification value that vary over time, thereby calculating a modified parameter, and controlling the device based on the modified parameter, wherein the first modification value has a shorter term for modifying the control parameter than the second modification value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.