Substrate processing device comprising door unit having inclined surface
US11701693B2 · kind B2 · utility
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14Claims
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Assignee
Inventors
Key dates
| Filing date | Nov 5, 2020 |
| Grant date | Jul 18, 2023 |
| Priority date | — |
| Expiry date | Nov 5, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/677
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The substrate processing device according to one embodiment may comprise: a chamber unit provided with a processing space therein and comprising an inclined chamber surface having an opening; a door unit comprising an inclined door surface, which corresponds to the inclined chamber surface, and capable of being coupled to the chamber unit; and a door driving unit for driving the door unit so as to open/close the processing space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.