Apparatus and method for treating substrate
US11705350B2 · kind B2 · utility
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6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 5, 2019 |
| Grant date | Jul 18, 2023 |
| Priority date | — |
| Expiry date | Jan 17, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The inventive concept provides an apparatus and method for removing a film formed on a substrate. A method for treating the substrate includes a primary solvent dispensing step of dispensing an organic solvent onto the substrate to remove a photoresist film on the substrate and an ozone dispensing step of dispensing a liquid containing ozone onto the substrate to remove organic residue on the substrate, after the primary solvent dispensing step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.