Patent · US Active

Nano-indent process for creating single photon emitters in a two-dimensional materials platform

US11705535B2 · kind B2 · utility

0Cited by
3References
9Claims
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Key dates

Filing dateJul 1, 2020
Grant dateJul 18, 2023
Priority date
Expiry dateDec 19, 2041

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/856
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A nano-indent process for creating a single photon emitter in a two-dimensional materials platform comprising the steps of providing a substrate, providing a layer of polymer, providing a layer of two-dimensional material, utilizing a proximal probe, applying mechanical stress to the layer of two-dimensional material and to the layer of polymer, deforming the layer of two-dimensional material and the layer of polymer, and forming a nano-indent in the two-dimensional material. A single photon emitter in a two-dimensional materials platform comprising a substrate, a deformable polymer film, a two-dimensional material, and a nano-indent in the two-dimensional material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.