Patent · US Active

Method for manufacturing a handle substrate intended for temporary bonding of a substrate

US11710653B2 · kind B2 · utility

0Cited by
2References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 27, 2021
Grant dateJul 25, 2023
Priority date
Expiry dateSep 10, 2041

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2224/83948
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Manufacturing a handle substrate includes: providing a support substrate having a receiving face; depositing an anti-adherent formulation including a first solvent over the receiving face of the support substrate so as to form a film; depositing a liquid formulation over a face of the film, before the complete evaporation of the first solvent, the liquid formulation being intended to form an adhesive layer; and evaporating the first solvent so as to obtain an anti-adherent film from the film in order to obtain the handle substrate and to obtain a bonding energy between the anti-adherent film and the adhesive layer lower than about 1.2 J/m2. The step of depositing of a liquid formulation is carried out when the face of the film has a water drop angle smaller than 65 degrees, so as to avoid any risk of dewetting of the liquid formulation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.