Patent · US Active

Evaporator, deposition arrangement, deposition apparatus and methods of operation thereof

US11713506B2 · kind B2 · utility

0Cited by
3References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 5, 2018
Grant dateAug 1, 2023
Priority date
Expiry dateNov 5, 2038

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E60/10
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A depositing arrangement for evaporation of a material is disclosed herein. The depositing arrangement has an alkali metal or alkaline earth metal for deposition of the material on a substrate. The deposition arrangement has a first chamber configured for liquefying the material; a valve being in fluid communication with the first chamber, and being downstream of the first chamber, wherein the valve is configured for control of the flow rate of the liquefied material through the valve. The deposition arrangement has an evaporation zone being in fluid communication with the valve, and being downstream of the valve, wherein the evaporation zone is configured for vaporizing the liquefied material; a heating unit to heat the material to higher temperatures before providing the liquid material in the evaporation zone; and one or more outlets for directing the vaporized material towards the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.