Patent · US Active

Silicon carbide diode with reduced voltage drop, and manufacturing method thereof

US11715769B2 · kind B2 · utility

1Cited by
2References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 14, 2021
Grant dateAug 1, 2023
Priority date
Expiry dateJan 12, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D64/62

Abstract

An electronic device includes a solid body of SiC having a surface and having a first conductivity type. A first implanted region and a second implanted region have a second conductivity type and extend into the solid body in a direction starting from the surface and delimit between them a surface portion of the solid body. A Schottky contact is on the surface and in direct contact with the surface portion. Ohmic contacts are on the surface and in direct contact with the first and second implanted regions. The solid body includes an epitaxial layer including the surface portion and a bulk portion. The surface portion houses a plurality of doped sub-regions which extend in succession one after another in the direction, are of the first conductivity type, and have a respective conductivity level higher than that of the bulk portion.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.