Patent · US Active

Functionally integrated coating structures

US11718905B2 · kind B2 · utility

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Key dates

Filing dateMay 30, 2018
Grant dateAug 8, 2023
Priority date
Expiry dateMar 18, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32715
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Techniques for depositing a functionally integrated coating structure on a substrate are provided. An example method according to the disclosure includes receiving the substrate into a process chamber of a multi-process ion beam assisted deposition system, disposing the substrate in a first zone including a first evaporator species and a first ion beam, wherein the first evaporator species is Aluminum Oxide (Al2O3), disposing the substrate in a second zone including a second evaporator species and a second ion beam, wherein the second evaporator species is Yttrium Oxide (Y2O3), and disposing the substrate in a third zone including a third evaporator species and a third ion beam, wherein the third evaporator species is Yttrium Fluoride (YF3).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.