Mixing apparatus, mixing method and substrate processing system
US11724235B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2020 |
| Grant date | Aug 15, 2023 |
| Priority date | — |
| Expiry date | May 29, 2041 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01F2101/58
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A mixing apparatus includes a phosphoric acid aqueous solution supply, an additive supply, a tank, a phosphoric acid aqueous solution supply path and an additive supply path. The phosphoric acid aqueous solution supply is configured to supply a phosphoric acid aqueous solution. The additive supply is configured to supply an additive configured to suppress precipitation of a silicon oxide. The phosphoric acid aqueous solution supply path is configured to connect the phosphoric acid aqueous solution supply with the tank. The additive supply path is configured to connect the additive supply with the tank. The additive is supplied while fluidity is imparted to the phosphoric acid aqueous solution supplied from the phosphoric acid aqueous solution supply into the tank.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.