Patent · US Active

Deposition or cleaning apparatus with movable structure

US11725279B2 · kind B2 · utility

0Cited by
11References
10Claims
0Family size

Assignee

Inventor

Key dates

Filing dateFeb 8, 2017
Grant dateAug 15, 2023
Priority date—
Expiry dateFeb 8, 2037

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68792
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A deposition or cleaning apparatus including an outer vacuum chamber and a reaction chamber inside the outer chamber forming a double chamber structure. The reaction chamber is configured to move between a processing position and a lowered position inside the outer vacuum chamber, the lowered position being for loading one or more substrates into the reaction chamber

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.