Patent · US Active

Wafer bonding apparatuses

US11728200B2 · kind B2 · utility

0Cited by
2References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 4, 2019
Grant dateAug 15, 2023
Priority date
Expiry dateJan 7, 2042

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L24/94
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A wafer bonding apparatus is provided includes a lower support plate configured to structurally support a first wafer on an upper surface of the lower support plate; a lower structure adjacent to the lower support plate and movable in a vertical direction that is perpendicular to the upper surface of the lower support plate, an upper support plate configured to structurally support a second wafer on a lower surface of the lower support plate, and an upper structure adjacent to the upper support plate and movable in the vertical direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.