Cleaning solution composition and cleaning method using the same
US11732217B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Jul 21, 2021 |
| Grant date | Aug 22, 2023 |
| Priority date | — |
| Expiry date | Aug 16, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.