Substrate processing apparatus with an air curtain in a loading/unloading part
US11749549B2 · kind B2 · utility
0Cited by
9References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 22, 2020 |
| Grant date | Sep 5, 2023 |
| Priority date | — |
| Expiry date | Aug 5, 2040 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present disclosure relates to a substrate processing apparatus, and more specifically, to a substrate processing apparatus capable of blocking the introduction of external air and external particles into a chamber by forming an air curtain at a loading/unloading part when the chamber is open. The substrate processing apparatus of the present disclosure includes a chamber in which a space is formed, and a fluid injection part configured to inject a fluid from an outer side of a substrate loading/unloading part of the chamber through which a substrate is loaded and unloaded.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.