Optical arrangement and method for correcting centration errors and/or angle errors
US11754831B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 4, 2020 |
| Grant date | Sep 12, 2023 |
| Priority date | — |
| Expiry date | Dec 24, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to an optical arrangement and a method for correcting centration errors and/or angle errors in a beam path. The beam path here comprises an optical compensated system in which at least two optical elements are present and aligned relative to one another such that imaging aberrations of the optical elements are compensated. According to the invention, a correction unit is arranged in an infinity space of the beam path and between the at least two optical elements, wherein the correction unit changes the propagation direction of radiation propagating along the beam path and the correction unit either has a reflective surface or is embodied to be transmissive for the radiation. The correction unit is movable such that the angle of a change in the propagation direction can be set.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.