Method and apparatus for layout pattern selection
US11755814B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 10, 2020 |
| Grant date | Sep 12, 2023 |
| Priority date | — |
| Expiry date | Jan 19, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06N20/00
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for determining a training pattern in a layout patterning process. The method includes generating a plurality of features from patterns in a pattern set; grouping the patterns in the pattern set into individual groups based on similarities in the plurality of generated features; and selecting representative patterns from the individual groups to determine the training pattern. In some embodiments, the method is a method for training a machine learning model in a layout patterning process. The method may include, for example, providing representative patterns from the individual groups to the machine learning model to train the machine learning model to predict a continuous transmission mask (CTM) map for optical proximity correction (OPC) in the layout patterning process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.